Description Of 4N HfO2 Target with Cu Backplate
The 4N HfO2 sputtering target with a copper backing plate is a critical, high-performance material for thin-film deposition, widely utilized across fields such as optics, semiconductors, and microelectronics. It consists primarily of a hafnium dioxide (HfO₂) target body-boasting a purity of 99.99%-bonded via a specialized process to a high-purity copper backing plate. This 4N HfO2 target represents a high-end coating material characterized by its advanced level of technological integration. By combining ultra-high-purity hafnium dioxide ceramic-serving as the functional material-with high-purity copper-acting as the structural support-it successfully meets the stringent demands of modern precision coating processes regarding the purity, performance, stability, and reliability of sputtering sources. Furthermore, its customizable specifications enhance its adaptability across diverse application scenarios and equipment platforms, establishing it as a fundamental material essential to driving technological advancements in industries such as optics and semiconductors.
Applications Of 4N HfO2 Target with Cu Backplate
Optical Coatings: Used to fabricate high-performance optical devices, including anti-reflective coatings, high-refractive-index dielectric layers, optical filters, laser component coatings, and laser-damage-resistant protective films.
Semiconductors and Microelectronics: Serves as a high-dielectric-constant gate dielectric material for advanced semiconductor devices; also utilized for the deposition of functional thin films in Micro-Electro-Mechanical Systems (MEMS) and other electronic components.
Other High-End Fields: Also finds significant applications in fiber-optic communications, energy devices, and scientific research experiments.
Specifications Of 4N HfO2 Target with Cu Backplate
Purity: >=99.9%
Shape: Discs, or Custom-made
Diameter: 2", 3", 4", 5", 6", or customized
Thickness: 0.25", 0.125", or customized
Quality Control and Testing Of 4N HfO2 Target with Cu Backplate
FAQ For 4N HfO2 Target with Cu Backplate
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A: Yes, we are a 4N HfO2 Target with a Cu Backplate factory, but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.
A: Generally, we send 4N HfO2 Target with a Cu Backplate by UPS, DHL, or FedEx. Also, we can send by sea to a seaport or by air to the closest airport.
Why is your 4N HfO2 Target with Cu Backplate so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process, and we obtain raw material directly from its source.
?
A: 100% full inspection for sure. All unqualified 4N HfO2 Targets with Cu Backplate are discarded.
A: From material preparation to machining and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.
What is the MOQ of 4N HfO2 Target with Cu Backplate?
A: Depends on the quantity of 4N HfO2 Target with Cu Backplate; generally, no MOQ limit.
?
A: A bank transfer (T/T) will be acceptable.
A: Around 7-20 days, which depends on the quantity and production of the 4N HfO2 Target with Cu Backplate.
A: Generally, we use a carton case or plywood case with protective material inside to ensure the safety of the 4N HfO2 Target with Cu Backplate.
A: From the order placed to cargo receiving will take around 10-25 days.
Etiqueta: 4n hfo2 target with cu backplate, China 4n hfo2 target with cu backplate suppliers, factory
